Advanced interconnects and contact materials and processes for future integrated circuits

Advanced interconnects and contact materials and processes for future integrated circuits

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.The algorithm makes use of fundamental RlClL2 relations for wiring delays, as well as predictive 3D interconnect density function histograms with y and x axes of wire length and inverse gate delay. The fundamental RLCLL2 relationsanbsp;...


Title:Advanced interconnects and contact materials and processes for future integrated circuits
Author: S. P. Murarka
Publisher: - 1998-11-02
ISBN-13:

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